What the buyer wrote
EBL Instrument (Lot1) and Lithography Data Prep System (Lot2) LOT1: The electron beam lithography (EBL) instrument requires both high performance and high reliability. Examples of key research goals include: 1. Patterning novel resists including self-assembled monolayers (SAMs) on glass or semiconductor substrates by direct writing onto the SAM with an electron beam. 2. Writing photonic crystals and optical waveguides on III-V semiconductor heterostructures such as GaAs/AlGaAs. 3. Writing leads onto 2D materials such as graphene and InSe. 4. Nano-electronic devices in GaAs/AlGaAs heterostructures. 5. Spintronic devices consisting of thin metal layers deposited by sputtering onto sem…
Details
- What the buyer calls it
- EBL_Electron Beam Lithography Equipment_2 LOTS
- How they are buying
- Advertised, open to anyoneAny supplier could bid without being invited first.
- Type
- goods
- Work starts
- 17 Apr 2016
- Work ends
- 29 Jul 2016
- Kind of work
- SEN and inclusion services
Who the buyer named
Charles Ellis was the named contact on this notice.