Inductively-Coupled Plasma Reactively Ion Etching (ICP-RIE) System
What the buyer wrote
We want to acquire an Inductively-Coupled Plasma Reactively Ion Etching (ICP-RIE) system. The system should be able to etch the surface of samples utilising RIE physical-chemical mechanism. The System will be located in a class 10000 cleanroom space and will be operated by students and technical staff. The System should integrate smoothly with the existing facilities without any prejudice for the normal operation. The main purpose for the System is the definition of silicon and silicon-related waveguide structures for integrated quantum photonics applications. Such structures are typically defined on 6-inch silicon-on-insulator wafers with 220nm-thick crystalline silicon films. The system s…
Details
- What the buyer calls it
- Inductively-Coupled Plasma Reactively Ion Etching (ICP-RIE) System
- How they are buying
- Advertised, open to anyoneAny supplier could bid without being invited first.
- Type
- goods
- Suitable for small firms
- The buyer says yes. What that is worth
- Work starts
- 20 Feb 2017
- Work ends
- 19 Feb 2022
Who the buyer named
Catherine Summers was the named contact on this notice.