Plasma-Enhanced Chemical Vapour Deposition (PECVD) System
What the buyer wrote
We want to acquire a Plasma-Enhanced Chemical Vapour Deposition (PECVD) system. Your proposed System should be able to deposit thin films of silicon oxide, silicon nitride, combinations of both (silicon oxynitride) and also amorphous silicon. Your proposed System will be located in a class 10000 cleanroom space and will be operated by students and technical staff. Your proposed System should integrate smoothly with the existing facilities without any prejudice for the normal operation of the space. We envisage two main purposes for your proposed System: the deposition of dielectric cladding and mask layers for the fabrication of silicon photonic circuits based on SOI technology and the depo…
Details
- What the buyer calls it
- Plasma-Enhanced Chemical Vapour Deposition (PECVD) System
- How they are buying
- Advertised, open to anyoneAny supplier could bid without being invited first.
- Type
- goods
- Suitable for small firms
- The buyer says yes. What that is worth
- Work starts
- 20 Feb 2017
- Work ends
- 19 Feb 2022
- Kind of work
- Roofing, windows and building fabric
Who the buyer named
Debbie Dooley was the named contact on this notice.