Supply of a Plasma Etch Tool for Silicon Carbide (SiC) Etching
What the buyer wrote
This Tender Specification is for the supply and delivery of a Plasma Etch Tool for SiC etching. In procuring this system, the University is seeking to augment its well-established existing plasma etch and deposition tool set, expanding the capabilities that the CISM will be able to provide. The new tool will be of strategic importance in delivering both frontside SiC etch capability for power MOSFET trench applications, and backside SiC via etch capability for GaN-on-SiC device applications. Reliability of the equipment is therefore paramount to maintaining, supporting and complimenting the wide array of experimental work that will be conducted within the facility.
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Awarded to
Details
- What the buyer calls it
- Supply of a Plasma Etch Tool for Silicon Carbide (SiC) Etching
- How they are buying
- Advertised, open to anyoneAny supplier could bid without being invited first.
- Type
- goods
- Where
- in Wales
- Kind of work
- Supplies and catering
Who the buyer named
Chris Grant was the named contact on this notice.
